We offer flexible, configurable process tools and leading-edge processes for the precise, controllable and repeatable engineering of micro- and nano-structures. Our systems provide process solutions for the etching of nanometre sized features, nanolayer deposition and the controlled growth of nanostructures.

These solutions are based on core technologies in plasma-enhanced deposition and etch, ion-beam deposition and etch, atomic layer deposition, deep silicon etch and physical vapour deposition.

Products range from compact stand-alone systems for R&D, through batch tools and up to clustered cassette-to-cassette platforms for high-throughput production processing.

Contact us: plasmainfo@oxinst.com

LABIS, our partner in Poland puts up an impressive display at Nano Rzeszow 2016 event on nanostructured materials. pic.twitter.com/IfsMssSoyb
4:10 PM - 26 May 16
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