Workshop at Cornell University

Cornell, Ithaca, NY, USA
20 - 21 August 2013
Businesses Attending:
Plasma Technology

Oxford Instruments Plasma Technology & Cornell University will hold a technical seminar addressing latest research and technologies in plasma etch deposition and growth.

This 1 1/2 day event is on 20th and 21st August, at Cornell University, and will include presentations, discussions, a poster session focussing on latest innovations, and a networking lunch.

Speakers are from key international research institutes, who will discuss their research, and they include:
Prof. Peter Ashburn, Southampton University, UK
Vince Genova, Cornell University

Axel Scherer , Caltech, CA

With more speakers to be announced

In addition, experts in their field from Oxford Instruments & Cornell University will speak on the latest process and applications developments in a number of plasma processing areas.

Presentations currently include:

Presentations currently include:
ALD applications
An overview of Plasma ALD process
MEMS process
Dielectric Etching at the nanoscale
Fine dimension metal and metal compound etching

Information, schedule, and registration:

This event is free of charge, but registrations must be submitted [online] in advance to facilitate planning. Please register by Monday, August 12th

For any further information please contact:

LABIS, our partner in Poland puts up an impressive display at Nano Rzeszow 2016 event on nanostructured materials.
4:10 PM - 26 May 16
View more of our tweets