Ion Beam Deposition process types:
- IBD - Ion Beam Deposition
- RIBD - Reactive Ion Beam Deposition
Hardware:
- Rotating and tiltable substrate holder (Ionfab 300 plus (SM) and (LC) only)
- Deposition Ion Source: 15 cm, 13.56 MHz driven
- PBN beam neutralisation
- Gas inlet through source, assist source and into the chamber
- Independently changeable parameters: gas flows, ion energy, ion current, accelerator voltage, beam neutralisation
- Mutiple targets with fixed shields and rotating shutters
- Second source as assist source to control stochiometry (e.g. depositing oxide from metal target) or as pre-cleaning on (Ionfab 300 plus (SC) and (LC) only)
Please contact us to discuss your specific requirements.
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Key Applications
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Benefits
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Ion Beam Deposition Systems
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Key Applications for Ion Beam Deposition
- Ring laser gyroscope mirrors
- High power laser optics
- Gravity wave detector mirrors
- Astronomical instrumentation
- Anti reflecting and high reflecting coating (e.g. laser bars)
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Benefits of Ion Beam Deposition
- High surface quality
- Dense smooth films
- Very low scattering
- Very low optical losses
- Very good run to run repeatability
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- Excellent uniformity
- Maximum flexibility
- Range of applications
- Process repeatability
- Low cost of ownership
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Ion Beam Deposition Systems
| Target size |
8 inch target |
14 inch target |
| Number of target |
Up to 4 targets |
Up to three targets |
| Platen size |
Up to 8 inch wafer |
Rotating planetary (4 x 10") |
| End point detection |
Dual Xtal monitors |
Dual Xtal monitors |
| Platen rotation |
Up to 20rpm (high speed option) |
Up to 20rpm |
| Platen tilt angle |
-90ºC to +75ºC |
NA |
| Platen temperature |
10ºC to 300ºC |
NA |
| Ion source |
15cm RF ion source |
15cm RF ion source |
| Assist or Pre-clean source |
15 or 35cm RF ion source |
NA |