The SEM shows Al deposited on 1 : 1 and 2 : 1 aspect ratio Si lines.There is a continuous metal film on the walls, even into the notchat the bottom corners
Related Product: System 400
Technology:Magnetron Sputtering rotating table
Results:- rate: 50 nm/ min at 5 kW- uniformity: +/- 5 % (6” wafer)- excellent step coverage- smooth surface
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