Al Sputter Deposition - Aluminium Sputter Deposition 

Al Sputter Deposition

The SEM shows Al deposited on 1 : 1
and 2 : 1 aspect ratio Si lines.
There is a continuous metal film on
the walls, even into the notch
at the bottom corners

Al Sputter Deposition - Aluminium Sputter Deposition with excellent step coverage

Related Product: System 400

 

Technology:
Magnetron Sputtering rotating table

Results:
- rate: 50 nm/ min at 5 kW
- uniformity: +/- 5 % (6” wafer)
- excellent step coverage
- smooth surface

 

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Related Products

Related Information

Deposition Processes - Deposition Process
SiN Deposition - Silicon Nitride Deposition
Hfn Deposition - Hafnium Deposition
High Quality Optical Coatings
Magnetron Sputtering - ITO Deposition - Indium Tin Oxide Deposition
Al2O3 - Aluminium Oxide Deposition
Ion Beam Deposition of VaO(5-x) - Vanadium Pentoxide Deposition
TiO2 Deposition - Titanium Dioxide Deposition
ZnO ALD - Zinc Oxide Atomic Layer Deposition
La2O3 Deposition - Lanthanum(III) Oxide Deposition
Ru Deposition - Ruthenium Deposition
a-Si Deposition - Amorphous Silicon Deposition (PECVD)
DLC PECVD - Diamond like Carbon Plasma Enhanced Chemical Vapour Deposition
SiC Deposition - Silicon Carbide Plasma Enhanced Chemical Vapour Deposition
SiGe Deposition - Silicon Germanium Deposition
PolySi Deposition - Polysilicon Deposition

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