High Quality Optical Coatings: SiO2, TiO2, Ta2O5

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Theoretical Model: UV mirror at 0° Angle
Of Incidence (AOI) (solid) and 45° AOI (dashed)

Related Product:  Optofab3000

Due to sputtered atoms high energy, Ion beam sputtered films have a density very similar to the bulk density of the materials used. This density is extremely reproducible from run to run. With care it is possible to deposit many materials in an amorphous or semi-crystalline state. This is often highly advantageous for optical coatings, as it reduces the effect of birefringence. 

 A major feature of an optical coating is it's surface quality. The quality of the surface determines the performance of the optical device itself. High quality optical coatings start with a smooth super-polished optical substrate with roughness typically of 0.05 nm rms.
A conventionally deposited film will add roughness to the surface of the optical substrate, the degree of the roughness dependant upon the technique used. For example a film deposited by evaporative techniques produces a surface roughness of typically 1 nm rms, wile ion assisted deposition techniques produce a surface roughness of typically 0.4 nm rms. Ion beam sputter deposition produces films with a surface roughness equal to that of the super-polished substrate, 0.05 nm rms. 

 A high quality optical coating should have low optical loss. Losses inside an optical coating arise from scatter and absorption. Ion beam sputtering produces films with total losses so low that sophisticated devises are needed to measure them. Data for the measurement of mirrors with losses less than 2ppm have been published by two independent groups. Both groups made their mirrors on Oxford Instruments Ion beam sputter deposition systems.

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Related Information

Deposition Processes - Deposition Process
SiN Deposition - Silicon Nitride Deposition
Hfn Deposition - Hafnium Deposition
Magnetron Sputtering - ITO Deposition - Indium Tin Oxide Deposition
Al2O3 - Aluminium Oxide Deposition
Ion Beam Deposition of VaO(5-x) - Vanadium Pentoxide Deposition
TiO2 Deposition - Titanium Dioxide Deposition
ZnO ALD - Zinc Oxide Atomic Layer Deposition
La2O3 Deposition - Lanthanum(III) Oxide Deposition
Al Sputter Deposition - Aluminium Sputter Deposition
Ru Deposition - Ruthenium Deposition
a-Si Deposition - Amorphous Silicon Deposition (PECVD)
DLC PECVD - Diamond like Carbon Plasma Enhanced Chemical Vapour Deposition
SiC Deposition - Silicon Carbide Plasma Enhanced Chemical Vapour Deposition
SiGe Deposition - Silicon Germanium Deposition
PolySi Deposition - Polysilicon Deposition

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