Silicon-on-Insulator Bosch Etch (SOI)

SOI Bosch Etch - Click for larger image
Typical notch-free features etched
in 100µm SOI using the Bosch process

Silicon-on-Insulator (SOI) ICP Etching

Standard Process Specification
Bosch Silicon-on-Insulator Etching in the PlasmaPro System100-ICP 180 & ICP380

Wafer Size

ICP180

 

100mm

Wafer Size

ICP380

 

up to 200mm

Etch rate  > 2 µm/min

  • Features 
  •  
  •  
  •  
  •  

Process Features

  • The process offers anisotropic high aspect ratio silicon etching from 5µm to through-wafer depths. Special hardware is used to control notching at the SOI interface.
Contact Us

Related Products

Related Information

Etch Processes - Etching Processes
GaAs/AlGaAs Etching - Gallium Arsenide/Aluminium Gallium Arsenide Etch
InSb Etching - Indium Antimonide Etch
InGaAlP Etching - Aluminium gallium indium phosphide Etch
GaSb Etching - Gallium Antimonide Etch
Deep GaP Etching - Gallium Phosphide Etch
InP Etching - Indium Phosphide Etch
ZnSe Etching Zinc Selenide Etch
InAlAs Etching - Indium Aluminium Arsenide Etch
InP/ InGaAsP Etching - Indium Phosphide/ Indium Gallium Arsenide Etch
GaN Etching, Gallium Nitride Etch, Gallium Nitride Etching
Aluminium Etch, Al Etching
Au Etching - Gold Etch
Cr Etching - Chromium Etch
Cu Etching - Copper Etch
Pr Etching - Photoresist Etch
Silyated Photoresist Etching - Silyated Photoresist Etch
Polyimide Etching - Polyimide Etch
PMMA Etching - Polymethyl Methacrylate Etch
PDMS Etching - Polydimethylsiloxane Etch
Diamond Etching - Diamond Etch
BCB ICP Etching - Benzocyclobutene Etch
LiNbO3 Etching - Lithium Niobate Etch
LiTaO3 Etching - Lithium Tantalum Oxide Etch
SiC Etching - Silicon Carbide Etch
PZT Etching - Lead Zirconium Titanate Etch
ITO Reactive Ion Etching - Indium Tin Oxide Etch
Al2O3 Etching - Aluminium Oxide Etch - Sapphire ICP Etching
PbSe Etching - Lead Selenide Etch
Bi2Te3 Etching - Bismuth Telluride Etch
Ta2O5 Etching - Tantalum Pentoxide Etch
GST Etching - Germanium Antimony Telluride Etching
Mo Etch - Molybdenum Etch
Nb Etching - Niobium Etch
Ni Etching - Nickel Etch
NiCr Etching - Nichrome Etch
Pt Etching - Platinum Etch
Ta Etching - Tantalum Etch
Ti Etching - Very Deep Titanium Etch
TiN Etching - Titanium Nitride Etch
W Etching - Tungsten Etch
WSi Etching - Tungsten Silicide Etch
Si Bosch Etching - Silicon Bosch Etch
Si Cryogenic Etching - Silicon Cryogenic Etch
Si Mixed Etching - Silicon (C4F8 - SF6) Etch
Silicon Hydrogen Bromide Etch (Si HBr)
Si (isotropic) Etching - Isotropic Silicon Etch
SiGe Etching - Silicon Germanium Etch
GaAs/AlGaAs Heterostructures: RIB/CAIBE Galium Arsenide/Aluminium Galium Arsenide Heterostructures: Reactive Ion Beam/Chemically Assisted Ion Beam Etch

Downloads And Links