Aluminium Etching (Al)

Anisotropic Al Etch
Anisotropic Al etch with resist intact 

ICP sources

  • ICP 65 for pieces and small wafer
  • ICP 180 for up to 4" wafers
  • ICP 380 for up to 8" wafers
  • Results 
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 Results  Technology
  • Rate: 0.4 µm/ min
  • High selectivity to SiO2 underneath
  • Selectivity to photoresist mask > 3 : 1
  • Linewidth loss < 0.05 µm/ side in passivation / resist strip
  • Reactive Ion Etching with ICP Source (13.56 MHz)
  • Inductively Coupled Plasma
  • RF driven substrate electrode
  • Substrate temperature control
  • HBr, Cl2 based multi step process
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Related Products

Related Information

Etch Processes - Etching Processes
GaAs/AlGaAs Etching - Gallium Arsenide/Aluminium Gallium Arsenide Etch
InSb Etching - Indium Antimonide Etch
InGaAlP Etching - Aluminium gallium indium phosphide Etch
GaSb Etching - Gallium Antimonide Etch
Deep GaP Etching - Gallium Phosphide Etch
InP Etching - Indium Phosphide Etch
ZnSe Etching Zinc Selenide Etch
InAlAs Etching - Indium Aluminium Arsenide Etch
InP/ InGaAsP Etching - Indium Phosphide/ Indium Gallium Arsenide Etch
GaN Etching, Gallium Nitride Etch, Gallium Nitride Etching
Au Etching - Gold Etch
Cr Etching - Chromium Etch
Cu Etching - Copper Etch
Pr Etching - Photoresist Etch
Silyated Photoresist Etching - Silyated Photoresist Etch
Polyimide Etching - Polyimide Etch
PMMA Etching - Polymethyl Methacrylate Etch
PDMS Etching - Polydimethylsiloxane Etch
Diamond Etching - Diamond Etch
BCB ICP Etching - Benzocyclobutene Etch
LiNbO3 Etching - Lithium Niobate Etch
LiTaO3 Etching - Lithium Tantalum Oxide Etch
SiC Etching - Silicon Carbide Etch
PZT Etching - Lead Zirconium Titanate Etch
ITO Reactive Ion Etching - Indium Tin Oxide Etch
Al2O3 Etching - Aluminium Oxide Etch - Sapphire ICP Etching
PbSe Etching - Lead Selenide Etch
Bi2Te3 Etching - Bismuth Telluride Etch
Ta2O5 Etching - Tantalum Pentoxide Etch
GST Etching - Germanium Antimony Telluride Etching
Mo Etch - Molybdenum Etch
Nb Etching - Niobium Etch
Ni Etching - Nickel Etch
NiCr Etching - Nichrome Etch
Pt Etching - Platinum Etch
Ta Etching - Tantalum Etch
Ti Etching - Very Deep Titanium Etch
TiN Etching - Titanium Nitride Etch
W Etching - Tungsten Etch
WSi Etching - Tungsten Silicide Etch
Si Bosch Etching - Silicon Bosch Etch
Si Cryogenic Etching - Silicon Cryogenic Etch
Si Mixed Etching - Silicon (C4F8 - SF6) Etch
Silicon Hydrogen Bromide Etch (Si HBr)
Si (isotropic) Etching - Isotropic Silicon Etch
SiGe Etching - Silicon Germanium Etch
SOI Bosch Etching - Silicon-on-Insulator Bosch Etch
GaAs/AlGaAs Heterostructures: RIB/CAIBE Galium Arsenide/Aluminium Galium Arsenide Heterostructures: Reactive Ion Beam/Chemically Assisted Ion Beam Etch

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