SiGe Etching - Silicon Germanium Etch

SiGe Etching

Image courtesy of the Ruhr University
Bochum Lehrstuhl für Elektronische
Bauelemente

Silicon Germanium Etch from Oxford Instruments

  • Anisotropic F Etching into a Si / SiGe / Si Heterostructure
  • Rate ca 100 nm / min
  • 0.5 µm deep
  • Photoresist mask removed 
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Related Products

PlasmaPro System100
Load Locked Tool for SiGe Etching

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