Plasma Technology Seminars 2010

Our 2009 workshops and seminars held in conjunction with the University of Southampton, UK; Cornell, UCSB and  Lawrence Berkeley National Laboratory, CA, USA; & TUe Eindhoven, Netherlands were a great success, and we are currently planning our 2010 series.

The seminars' wide programmes will include talks by Oxford Instruments Plasma Technology (OIPT) applications & development scientists, in addition to key guest speakers and researchers from the host Universities.

2010 Seminars

15-16th July 2010

Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, CA, USA
New Frontiers in Plasma Nanopatterning

For more information or to register for this seminar click here

Programme:

15th July 2010   8:00am - 5:30pm  

Nanomagnetic logic Prof Jeff Bokor UCB
Selective ALD Pat Bennett UCB
Recent advancements in (plasma-assisted) ALD: from c-Si photovoltaics to direct-write patterning Prof Erwin Kessels TUe, NL
Mask Etching - Inorganic resists Prof Doug Keszler OSU
Correlation between surface chemistry and ion energy dependence of the etch yield in multicomponent oxides etching Prof Joelle Margot INRS
Pt Plasma vs Thermal and Latest developments Chris Hodson OIPT
Plasma diagnostics link to ‘on wafer’ performance Dr Ying Wu OIPT
Patterning of Graphene Dr Xiaogan Liang LBNL
Novel metamaterials with novel nanopatterning Dr Stefano Cabrini LBNL

General intro to the Molecular Foundry &

Group tours of the Nanofab and Foundry
David Bunzow LBNL

Wine and Cheese Reception:

A time to chat with the speakers!

Process applications desk on hand

Poster session

16th July 2010   8:30am - 12:30pm

Intro to Nanofabrication Facility and Oxford Instruments LBNL & OIPT  
Note: Workshops and tours below  will run concurrently to allow participants to attend all sessions
Cleanroom tours in groups LBNL Staff
Intro to ALD/PECVD Chris Hodson OIPT
Intro to Plasma Diagnostics

Prof Steve Shannon

& OIPT

NCSU
Intro to Nanofabrication & Etching

Prof Ivo Rangelow, Uni Ilmenau, Andy Goodyear, OIPT & 

Dr Deirdre Olynick, LBNL

OIPT

LBNL

To register for this seminar click here

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27-28th September 2010

University of Freiburg, Germany
Workshop on Dry Processing for Nanoelectronics and Micromechanics

To register for this seminar click here

Programme:

27th September 2010

Mass spectrometry for ALD Sebastian Gutsch IMTEK
SIMS for ion beam etching    Sebastien Pochon OIPT
Review of plasma sources Andy Goodyear OIPT
Parallel Plate-13.56 MHz, 81 MHz and ICP PECVD Damian Pysch FhG ISE
Plasma and mechanical cleaning of PECVD Systems Dr Owain Thomas OIPT
Controlled ZnO nanowire growth in the Nanofab700 Johannes Ruhhammer IMTEK
Troubleshooting in ALD Saleem Shabbir OIPT
Si Etching review Colin Welch OIPT
Poster session, Lab tour & CONFERENCE DINNER

28th September 2010

ALD Review  Chris Hodson  OIPT
Charging effect simulation model,  embedded in the integrated plasma processing simulation framework,  used for modelling of the notching effect V Ishchuk, B Volland, M Hauguth, I Rangelow Uni Ilmenau
Endpoint Detection and in situ analysis for plasma systems Andy Goodyear  OIPT
Optimized PECVD SiOx layers for Si nanocrystal applications Andreas Hartel IMTEK
The use of liners for dry etching and deposition Colin Welch OIPT
The "bias" in dry etching Andy Goodyear OIPT

To register for this seminar click here

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