Academic Posters

Academic Posters from OIPT

Oxford Instruments Plasma Technology's experienced work force comprises of many highly skilled application and process engineers, who write and publish many academic posters for conferences, exhibitions and seminars. Please follow the links below to download any of these posters.

 Choose from our range of published academic posters:

• Advances in Large Batch Gallium Nitride Etching Process for 9th International Conference on Nitride Semiconductors (ICNS-9) LED Production Solutions  Authors: Zhong Ren, Stephanie Baclet, Andrew Newton, Andy Goodyear, Mark Dineen and Robert Gunn, OIPT
• Conformal ALD layers grown with AAO templates and Carbon Nanotubesby remote plasma and thermal ALD Authors: Q. Fang, C.G. Xu and C. Hodson, OIPT. M. Liu, and G.H. Li, ISSP
• Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD Authors: Q. Fang, C. Hodson, OIPT
• Preliminary investigation of high-k materials Ti doped Ta2O5 Films by remote plasma ALD Authors: Q. Fang, C. Hodson, R. Gunn, OIPT. M. Liu, ISSP. Z.W. Fang, R. Potter, Uni. Liverpool
• Nucleation and growth of platinum films on high-k/metal gate materials by remote plasma and thermal ALD Authors: Qi Fang, Chris Hodson, Cigang Xu and Robert Gunn, OIPT
• Ion Beam Milling using SIMS monitoring/control and directional Reactive Ion Beam Etching profile control for optoelectronic devices Authors: Dr Dave Pearson & Dr Sebastien Pochon, OIPT
• Characterisation and Comparison of Fused Silica Etch Processes in Fluorocarbon-based ICP Chemistries Author: Colin Welch, OIPT 
• Comparison of Etch Processes for Patterning High Aspect Ratio and Nanoscale Features in Silicon Authors: Robert Gunn, Dean Stephens & Colin Welch
• Temperature Control of Multiple Wafers During Etching of 2” Sapphire Wafers for Patterned Sapphire Substrates (PSS) Authors: Dr Mark Dineen & Dr Zhong Ren, OIPT