Qi Fang PhD, Senior Applications Engineer, OIPT
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Colin Welch, Principal Applications Engineer, OIPT
Cigang Xu PhD, Development Scientist, OIPT
The Plasma Enhanced Chemical Vapour Deposition (PECVD) process has been employed for the growth of carbon nanotubes, in addition to techniques such as laser ablation, arc discharge and Chemical Vapour Deposition (CVD). PECVD tools provide more flexibility and control compared to a general CVD setup.
Mike Cooke PhD, New Product Introduction Manager, OIPT
Ask any chemical engineer what’s the most important process variable, and they are likely to reply, ‘temperature’. When we plasma etch a wafer, or deposit a layer by PECVD, is the temperature just as critical? In plasma processes, most of the chemistry is driven not by the surface temperature, but by the electron temperature in the plasma.
Oxford Instruments Plasma Technology’s orders reach record high
OIPT recently won an order from a leading manufacturer of HB-LEDs for three Plasmalab®System133 ICP380 plasma etch tools for use in High Brightness LED (HB-LED) manufacturing.
Lawrence Berkeley National Laboratories orders 6 systems from Oxford Instruments
OIPT recently won an order for 6 systems to equip the Molecular Foundry at the Lawrence Berkeley National Laboratory (Berkeley Lab), California, USA.
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