Technical Articles and Posters: Oxford Instruments

Technical Articles from
Oxford Instruments Plasma Technology

Oxford Instruments Plasma Technology employs many highly qualified and skilled scientists and engineers, some of whom have written technical papers and articles that have been published. These are available for viewing on the links below:

White Paper: Growth of platinum films by atomic layer deposition (ALD) - Dr Qi Fang (2011)

White Paper: Dry Etching of InP based Materials using a high density ICP plasma system - Dr Ligang Deng (2010)

White Paper: Ion Beam Deposition - Dr Sebastien Pochon & Dr David Pearson (2010)

White Paper: ICP CVD - Dr Owain Thomas (2010)

White Paper: Comparison of etch processes for etching SiO2 dielectric films - Bob Gunn, Dean Stephens, Colin Welch, Ligang Deng, OIPT Applications Team (2009)

Article: High Structural Perfection AlN Templates on Off-Axis 6H-SiC Grown by HVPE Aim to Improve Device - Larry Leung, PhD, Product Manager, HVPE Products, OIPT (2009)

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