Ion Beam Tool for High Precision Deposition - Ionfab500Plus

Designed for ultra high quality optical thin films, the Ionfab500Plus was first supplied in 1983 and was the world’s first commercial ion beam sputter deposition system for ring laser gyroscope manufacture. In recent years customers have demonstrated mirrors exhibiting < 20ppm on a commercially available system using the Ionfab500Plus.

 

  • High Throughput 
  • Transmission Spectrum 
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  • The Ionfab500Plus Ion Beam Deposition System has been developed for the requirements of customers demanding high throughput.
  • This is delivered by the use of the 4 x 10” planetary substrates and the ability to use 14” targets.
  • Another key benefit to customers requiring high throughput is the use of up to 3 targets, meaning that different material layers may be deposited without breaking vacuum.

We work closely with our customers to develop new and customised processes according to their application needs; please contact us for details.

 

Transmission Spectrum - click for larger image

Transmission Spectrum of a mirror designed for 633nm at 45°

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

Transmission Spectrum of a mirror designed for 633nm at 45°, deposited in the Ionfab500Plus showing:

 Mirror Loss < 40 ppm
 Uniformity < ± 0.0005
 Surface roughness < 0.11nm

Excellent refractive index (RI) control and uniformity provides high product yield.

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