The OmniGIS supports three on-board gas sources and two additional external purge/carriers and yet only occupies a single GIS port.
It includes a recipe mode for the mixing of gases, a gas delivery valve that can deliver gas over a range of duty cycles, and a digital needle location control. This optimal gas delivery system enables high resolution nanopatterning and sophisticated processes, such as atomic layer deposition.
Finally, the OmniGIS employs user replaceable crucibles that enable source changes in less than 20 minutes with no realignment of the injector system. This enables one OmniGIS to support more than 3 sources and to have rotating “on the shelf” source readiness.
The features you want
- Industry Leading Gas Injector
- Single needle - single port - multi-source
- Compatible with typical precursors for carbon, tungsten, platinum, and oxides, as well as XeF2 and water.
- Motor driven needle positioning
- Intuitive Graphical Software
- Different user levels
- “Drag & Drop” recipe builds
- Individual or mixed source delivery
- Local or remote control from SEM, FIB, and lithography systems
- Multi-Function Controller
- Stand-alone ethernet link to SEM/FIB computer
- Precision flow control
- Additional control of existing gas injectors
Our unique benefits
- Easy for beginners, powerful for advanced research
- Rapidly adapts to many different research applications
- Smooth motion and valve actuation for compatibility with manipulation tasks
- Higher resolution nanostructures through advanced control of gas flow and mixture
- Maximise options for TEM sample preparation
- Free up ports on the FIB/SEM