Oxford Instruments and Cornell Sign Cooperative Agreement

Oxford Instruments and the Cornell Nanoscale Science and Technology Facility (CNF) have developed a new partnership agreement, providing ongoing commitment and consolidation to an already established, successful relationship.

The national user facility at CNF, home to three of Oxford Instruments’ Plasmalab® systems used for etching processes and a broad spectrum of nanotechnology applications including optoelectronics and microelectronics, attracts users from over 200 universities and commercial companies from across the USA. This latest agreement is set to serve and exceed the demands of such a central user facility, encompassing service support and advanced process support initiatives.

Oxford Instruments applications engineers will support CNF staff and users in the development and implementation of advanced etch processes while learning first-hand the new requirements of a broad range of ongoing nanotechnology research applications. They will also work with CNF staff to assure efficiency and availability of the processing equipment 24/7.  The users of this facility are at the centre of this agreement, which allows Oxford Instruments to design, develop and continually innovate their instruments in line with the customer’s needs and application.

This site is just one of 13 nanotechnology facilities in the United States making up a National Nanotechnology Infrastructure Network (NNIN) - an integrated networked partnership of user facilities, supported by the National Science Foundation, serving the needs of nanoscale science, engineering and technology worldwide.

“Reliable advanced equipment with well supported processes is critical to the operation of a large user facility. This agreement will help us provide state-of-the-art etch technology to our users through priority access to Oxford Instruments applications and service support,” said Dr. Lynn Rathbun, Laboratory Manager at The Cornell Nanoscale Science and Technology Facility.

Adrian Waller, Support Manager at Oxford Instruments, said, “The CNF is a research and development focal point in the USA for many nanotechnology companies, some of which are current and potential customers for Oxford Instruments. This agreement ensures that we continue to innovate in line with application requirements and that users are happy with both the performance and efficiency of our Plasmalab systems. Combined, they ensure the state-of-the-art interactive and practicing environment that is so critical to their research.”

Cornell is a top reference site for Oxford Instruments, serving and taking the lead in plasma etching processing methods. This agreement brings mutual benefits to both parties, consolidating this well-established collaboration even further.