Deep Silicon Etch technology for MEMS process solutions

Flexible silicon etch process solutions for MEMS device production

The development of deep silicon etch technology from Oxford Instruments delivers industry leading process performance.

From smooth sidewall processes to high etch rate cavity etches, the PlasmaPro 100 Estrelas has been designed to ensure that the wide range of MEMS applications can be realised without the need to change the chamber hardware.

Deep Silicon Etch System - PlasmaPro 100 Estrelas

R&D and Production fabrication tools for MEMS device production

The development of the PlasmaPro Estrelas100 deep silicon etch technology from Oxford Instruments delivers industry leading process performance.

From smooth sidewall processes to high etch rate cavity etches, the PlasmaPro 100 Estrelas has been designed to ensure that the wide range of MEMS applications can be realised without the need to change the chamber hardware.

PlasmaPro 100 Estrelas Deep Silicon Etch System

Dr Ziad Melhem of Oxford Instruments NanoScience will be giving a talk at MIT on the enabling technologies, require… https://t.co/MDz2SojzYv
5:21 PM - 16 Feb 18
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