And the winner of our SEM Competition 2015 is...
Eindhoven University of Technology
For his SEM image titled:
Integrated nanoLED for photonic circuits
How it was created:
The metal-cavity nanoLED was fabricated in a III-V layer stack bonded to a silicon wafer for future compatibility with CMOS.
Three e-beam lithography steps were required to fabricate the nanocavity, waveguide and grating coupler, using HSQ and ZEP resists. After exposure and development, the pattern is transferred from the resist to a hardmask using an Oxford Instruments Plasmalab System 100 (RIE) tool, and later the semiconductor etching was done with a Plasmalab System 100 (ICP 180). The hardmasks used (SiO2 and Si3N4 ) were deposited with a Plasmalab System 100 (PECVD).
Afterwards, metallization is done by lift-off with optical lithography in order to fabricate the metal cavity and the electrical contacts.
Congratulations to Victor and thank you to all who entered, please browse through the top entries below.