Webinar "Taking Nano to the next level" on 26th March 2014
Presented by keynote industry speakers
Hosted by the IOP on Wed 26th March at 5pm (GMT), 10am Pacific Time
This webinar is free of charge, and will run for 1 hour including time for questions and answers at the end.
A focus on recent nanoscale etch and atomic layer deposition (ALD) advances from research to manufacturing applications, from industry leading speakers:
Talk 1: ALD and nanoscale etch processing techniques and results from recent work carried out at Lawrence Berkeley National Laboratory (LBNL), USA
Speaker: Deirdre Olynick, Staff Scientist, LBNL, CA, USA
Talk 2: Data storage, an expanding market application that has benefited from advanced ALD and nanoscale etch techniques
Speaker: Kim Lee, Seagate, CA, USA
ALD and nanoscale etch processing techniques and results from recent work carried out at Lawrence Berkeley National Laboratory (LBNL), USA
Abstract to follow
Challenges and Opportunities in Fabrication of Bit Patterned Media with Areal Density Beyond 1 Tdpsi
Bit patterned media (BPM) recording is currently being considered for the next generation high capacity magnetic recording. However, BPM presents extreme fabrication challenges, principally in lithography and pattern transfer, because of the small feature size and the tight spacing tolerance requirements. In lithography, directed self-assembly (DSA) of block copolymers has been proposed as a viable lithography strategy for BPM patterning.
At Seagate, a DSA process with sphere-forming PS-b-PDMS pattern (hcp) for coherent dot patterning over large area at density of up to 3.2 Tdpsi (center to center spacing of 15nm) has been developed. Using quartz templates patterned by this process, BPM media with areal density of up to 1.5Tdpsi have been successfully fabricated by NIL (nano-imprint lithography) and IBE (ion-beam etching) on 2.5” disks. Although significant progress in BPM patterning by DSA has been achieved, including incorporation of fully functional servo patterns, many challenges lay ahead. These include areal density extensibility of spherical BCP, and dot size and position variation control in DSA and pattern transfer.
Possible solutions such as patterning by DSA of lamellar BCP coupled with double patterning process, and the requirements for advanced RIE processes for nano-pattern transfer will be discussed.