Compound Semiconductor device process solutions

Oxford Instruments has a wide range of processing equipment suitable for Optoelectronic devices.

  • PECVD passivation achieves excellent breakdown voltage for optimal device performance
  • GaN etch for LEDs or lasers. GaN etch maintains surface quality and low damage
  • High etch rates for tough to etch materials
  • Non-selective GaAs/AlGaAs etch with smooth sidewalls and no notching at individual layers for VCSELs
  • Highly selective GaAs/AlGaAs etch for depth control. Process optimised for selectivity to AlGaAs layer
  • InP waveguide and laser facet etching with smooth, vertical sidewalls

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HBLED Applications & Systems