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Oxford Instruments and the Kavli Nanoscience Institute at the California Institute of Technology (CALTECH) are holding a one day workshop on 19th July 2017. 

Oxford Instruments Plasma Technology received the High Volume Manufacturing Award at the annual CS Industry Awards on 7th March 2017 in Brussels.

On Tuesday 4th April 2017 a technical workshop on Atomic Scale Processing will take place at MINATEC-LETI in Grenoble that will include a wide range of talks presented by...

Free webinar on Wednesday 19th October at 15:00 BST Discover Oxford Instruments’ latest process innovation: SiC via etch for RF device manufacture

As key providers of leading edge process technology equipment for HBLED manufacture, Oxford Instruments has been a major part of the HBLED industry since its very beginning....

As a leading provider of process solutions for a broad range of applications, Oxford Instruments is delighted to announce the development and launch of the SiC via plasma etch...

Oxford Instruments is ‘Bringing the Nanoworld Together’ in India once again - 22 - 23 November 2016 | IISc Bangalore

Leading provider of plasma etch and deposition equipment solutions, Oxford Instruments Plasma Technology is pleased to announce the recent appointment of Richard Pollard to the...

Oxford Instruments Plasma Technology recently won an order from Nanjing University of Post and Telecommunications, based in Nanjiang, Jiangsu, China for multiple plasma etch...

Oxford Instruments is delighted to announce the development and launch of the MoS2 growth process using its high performance Nanofab nanoscale growth system.

Impressive energy saving measures win Oxford instruments “Go Green” award

New etching process for Magnetic RAM developed by Cornell NanoScale Facility and Oxford Instruments Plasma Technology