4th April 2017 | 08:45-16:00 CEST | Minatec, Grenoble, France

The aim of this one-day workshop is to give an overview of current topics in the field of atomic scale processing for a range of applications. It is open to scientists and technologists working in industry and academia, with an interest in recent progress plus future trends in research and development.

Participation is free but registration is mandatory | Lunch and refreshments are included


Time Talk title
8:45-9:15 Registration & Coffee
9:15-9:30 Welcome & Introduction
Bernard AndrĂ©, Head of Materials and Technologies Department, Optronics and Photonics Division, CEA-LETI
Dr Mike Cooke, Oxford Instruments
9:30-10:00 Atomic Layer Etch (ALE): A precision technique to enable tomorrow's technology
Dr Mike Cooke, Oxford Instruments
10:00-10:30 Etching talk – title to be confirmed
Dr Thierry Chevolleau, CEA/PTA
10:30-11:00 Break
11:00-11:30 2D materials and ALD applications
Dr Ageeth Bol, Tue Eindhoven, NL
11:30-12:00 Ion Beam developments in etch and deposition
Dr Sebastien Pochon, Oxford Instruments
12:00-12:30 Speaker to be confirmed 
12:30-13:30 Lunch
13:30-14:00 Atomic Layer Deposition (ALD) New developments for atomic scale processing
Dr Harm Knoops, Oxford Instruments
14:00-14:30 2D materials fabrication technology and processes: The ‘Toolbox’ for Atomic Scale Processing
Dr Ravi Sundaram, Oxford Instruments
14:30-15:00 Break
15:00-15:30 Topic & speaker TBC
15:30-16:00 Q & A session – ask the experts!
Chaired by Dr Mike Cooke
16:00-16:15 Close and networking


Atomic Scale Processing Solutions

Atomic Scale Processing