PSS Plasma Etching - Chinese Language webinar recording
The aggressive drive for improved Cost of Ownership within the LED industry has driven the innovation within Oxford Instruments plasma technology. Optimised plasma processing offers many ways to improve device output and reduce manufacturing costs, a double windfall.
LED manufacture requires critical plasma etch steps (patterned sapphire substrates (PSS), and GaN etch) and deposition steps for passivation, current blocking and mask creation, these are performed by an increasing variety of techniques for example Plasma Enhanced Chemical Deposition (PECVD).
This presentation describes the approaches taken to increasing productivity in these processes, both by increasing the process rates and by increasing the number of wafers processed simultaneously.
Presenter: Dr Young Huang, Field and Lab Applications Manager
Dr. Young Huang received PhD degree in photonics technologies from National Tsing Hua University and started with Oxford Instruments in 2011 in Overseas Marketing Ltd., Asia Taiwan. Dr. Young has more than 10 years of experience in the LED chip and optical-electronic process. He is Field and Lab Applications Manager for developing new application process and ensuring field customer applications satisfaction.
This webinar was also presented in English by Dr Mark Dineen. View the English version