Chris Hodson, Product Manager Power Semiconductor and ICT devices, Oxford Instruments Plasma Technology
Chris Hodson has worked for Oxford Instruments for nearly 15 years and is currently a Product Manager with responsibility for Power Semiconductor and Information Communication Technology (ICT) related process equipment. During his career Chris has worked as a process engineer using a broad range of etch and deposition technologies, specialising on PECVD and ICP-CVD processes. Chris was involved with the Atomic Layer Deposition (ALD) development at Oxford Instruments and optimised the hardware and processes for Oxford Instruments’ range of ALD tools.
Professor Iain Thayne, Professor Ultrafast Systems (Electronic and Nanoscale Engineering), The University of Glasgow
Iain Thayne received his BSc degree in physics and electronic engineering from the University of Glasgow in 1986. Between then and 1988, he worked as a research scientist at Philips Research Labs in Redhill, Surrey, UK, on the realisation of compound semiconductor microwave transistors and integrated circuits.
From 2001-2006, he held a UK Engineering and Physical Sciences Research Council (EPSRC) Advanced Research Fellowship and was promoted to Profressor of Ultrafast Systems in 2005. He is lead investigator on the UK PowerGaN Consortium, a £6.2M five year Programme Grant funded by EPSRC, which comprises 33 researchers from the Universities of Bristol, Cambridge, Glasgow, Liverpool, Manchester, Nottingham and Sheffield investigating silicon compatible GaN power electronics components.