‘Nanoscale Plasma Processing 2012’ workshop at MTL, Cambridge, MA
MTL, Cambridge MA, USA
- 05 December 2012
- Businesses Attending:
Oxford Instruments Plasma Technology & MIT’s Microsystems Technology Laboratories (MTL), Cambridge, MA are holding a joint seminar which will address the latest research and technologies in plasma etch deposition and growth. This 1 day event on 5th December, at the MIT campus in Cambridge, MA, will be comprised of presentations, discussions, and a networking lunch, focussing on latest innovations.
The Seminar will include speakers from key international research institutes, who will discuss their research: Prof. Erwin Kessels, Technical University Eindhoven; Vince Genova, Cornell University. In addition, experts in their field from Oxford Instruments & MTL will speak about recent process and applications developments in a number of plasma processing areas.
Presentations cover a full day and currently include:
An Overview of Plasma ALD process
Nanoscale dielectric etching
PECVD & TEOS
This seminar is free of charge, but must be booked in advance as places are limited. To book a place or receive further information, email: firstname.lastname@example.org.