Nanoscale Plasma Processing - Beijing Seminar

Venue:
Crowne Plaza Beijing Zhongguancun, Beijing 北京中关村皇冠假日酒店(北京 海淀区 知春路106号, China
Date:
14 May 2013
Businesses Attending:
Plasma Technology

We are pleased to announce two workshops in May that will be suited to all those people working in industry and academia, with an interest in recent progress in research and development.
We will discuss future trends in the fabrication and application of micro & nano structures and devices, including HBLED. We are very fortunate to have our Oxford Instruments expert applications specialists presenting, and talks from speakers from prestigious Chinese guest organisations.
The 'Nanoscale Plasma Processing' Conference topics will include:

  • Developments in ALD
  • MEMS Deep Silicon Etch & Nano Cryo Etch
  • III-V Etching
  • GaN, Sapphire, AlGaInP Etch
  • Ion Beam developments in etch and deposition
  • 3D device packaging
  • HBLED production

And more talks to be confirmed
There will also be plenty of time during the day for questions and networking.
Book your place now!
To book a place at one of these seminars please contact:

Lingling Wang: lingling.wang@oxinst.com  

Tel: +86 216 073 2929

(There is no charge for the events but booking is essential)

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