ALD and Ion Beam Workshop  at UC Santa Barbara, CA

University of Santa Barbara (UCSB), CA, USA, USA
12 November 2013
Businesses Attending:
Plasma Technology

Time: 8:00am – 5:00pm

This event is being organised with our hosts UCSB,  and will cover several aspects of plasma etch and deposition, in particular Atomic Layer Deposition (ALD), Ion Beam etch and deposition technologies and Nanoscale etching.

Guest speakers from renowned research & manufacturing organisations, speakers from UCSB, and technical experts from Oxford Instruments will all speak on a number of topics. The program will also allow plenty of time for discussion and questions. In addition there will be a technical poster session by Oxford Instruments. This will be an excellent opportunity for networking between researchers, users and our guest speakers from academia and industry.

Program will include:

  • ALD Process (Metal & Nitride ALD)
  • ALD Hardware developments  
  • Ion Beam etch and deposition developments
  • Ion beam etch, a user's perspective
  • An introduction to plasma and themal ALD techniques  
  • ALD - a user's results
  • An introduction to Ion Beam technology
  • Ask the experts – questions, discussion and ion beam and ALD process posters with Oxford Instruments
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