Webinar: “Leading Techniques for the Nano-scale Etching and Deep Etching of Silicon”
Online Webinar, United Kingdom
- 31 October 2013
- Businesses Attending:
Michelle Bourke, Business Group Director at Oxford Instruments Plasma Technology has many years experience working in MEMS equipment and process development, and as such has a great understanding of the market.
As Micro Electro Mechanical Structures (MEMS) are adopted in more and more commercial and industrial applications some areas look to the nano world for developing technologies. In this paper the two leading techniques for deep etching of silicon, namely the “Bosch” process and a cryogenically cooled process will be discussed. We will update the latest results for these techniques and also look at the growing importance of nano-scale etching of silicon, which can be achieved consistently using the cryogenically cooled process. The paper will also briefly discuss atomic layer deposition (ALD) and demonstrate the role it can play in advanced micro and nano devices.
Live broadcast times: 11:30 AM - 12:30 PM EDT and 3:30 PM - 4:30 PM GMT