Patterned Sapphire Substrate Etching Using Innovative Plasma Processing Technology
- 04 June 2015
- Businesses Attending:
FREE Dual Language Webinar: Patterned Sapphire Substrate (PSS) Etching Using Innovative Plasma Processing Technology
Date: June 4th | Time: 15:00-16:00 CST (Beijing, China) | Languages: Mandarin Chinese and English
The aggressive drive for improved Cost of Ownership within the LED industry has driven the innovation within Oxford Instruments plasma technology. Optimised plasma processing offers many ways to improve device output and reduce manufacturing costs, a double windfall.
LED manufacture requires critical plasma etch steps (patterned sapphire substrates (PSS), and GaN etch) and deposition steps for passivation, current blocking and mask creation, these are performed by an increasing variety of techniques for example Plasma Enhanced Chemical Deposition (PECVD).
This presentation describes the approaches taken to increasing productivity in these processes, both by increasing the process rates and by increasing the number of wafers processed simultaneously.
There will be an opportunity to ask the speakers questions in both English and Chinese.
Dr Young Huang, Field and Lab Applications Manager (Mandarin Chinese)
Dr. Young Huang received PhD degree in photonics technologies from National Tsing Hua University and started with Oxford Instruments in 2011 in Overseas Marketing Ltd., Asia Taiwan. Dr. Young has more than 10 years of experience in the LED chip and optical-electronic process. He is Field and Lab Applications Manager for developing new application process and ensuring field customer applications satisfaction.
Dr Mark Dineen, Product Manager: Optoelectronics (English)
Dr Mark Dineen graduated from Cardiff University with a PhD on plasma etching of Gallium Nitride and started with Oxford Instruments in 2000. Working on etching of III-V materials then focusing on Gallium Nitride, Sapphire and HBLED related materials he has a wealth of experience related to Optoelectronics device manufacturing.