Workshop on Dry Processing for Nanoelectronics & Micromechanics: Deposition & Etching

Venue:
RWTH Aachen, Germany
Date:
20 - 21 September 2017
Businesses Attending:
Plasma Technology

Agenda:

Day 1: Wednesday 20th September Day 2: Thursday 21st September

09.15 h – 10.00 h | Welcome Coffee and Registration

10.00 h – 10.45 h | Dry Etching for MEMS applications | Dr Mark McNie - Oxford Instruments

10.45 h – 11.30 h | Tuning materials properties in plasma ALD by substrate biasing | Dr Harm Knoops - Oxford Instruments

11:30 - 11:45 | Coffee break

11.45 h – 12.15 h | Atomic Layer Etching (ALE) of GaN and 2D materials | Dr Mike Cooke - Oxford Instruments

12.15 h – 12.45 h | Optimising SiC Etching for via holes and feature | Dr Andrew Newton - Oxford Instruments

12.45 h – 14.15 h Lunch break

14.15 h – 14.45 h | Oxy-Nitrides and Metal (Al, Cu, Mo) deposition by Magnetron Sputtering | Dr Pauline Alvarez - Oxford Instruments

14.45 h – 15.15 h | Review of InP etch processes incl End Point Detection and Plasma Clean Processes | Dr Ligang Deng - Oxford Instruments

15.15 h – 15.30 h | Gap filling strategies using PECVD and ICP PECVD | Dr Owain Thomas - Oxford Instruments

15.30 h – 15.45 | ALD and CVD Deposited Multigate Structures for the Realization of Electrostatically Tuneable Devices |
Thomas Grap - RWTH Aachen

15.45 h – 16.15 h | GaN low damage etch by ICP RIE and ALE | Dr Andrew Newton - Oxford Instruments

16.15 h – 16.45 h | ALD on Graphene | Dr Neumaier - AMO Aachen

16.45 h – 17.00 h | Diamond Etching – applications and challenges | Dr Andrew Newton - Oxford Instruments

17.00 h – 18.30 h | - Coffee Break
- POSTER SESSION
- Lab Tour

19:30 CONFERENCE DINNER

09.00 h – 09.30 h | Ion Beam Deposition of SiO2, Ta2O5, TiO2 and VO2 | Dr Pauline Alvarez - Oxford Instruments

09.30 h – 10.00 h | In-Situ Optical Monitoring for High Precision Optical Coatings | Dr Simon Hicks - Intellemetrics

10.00 h – 10.45 h | 2D materials and heterostructures device fabrication techniques: CVD, PECVD, ALD, Sputtering, RIE, ALE | Dr Ravi Sundaram | Oxford Instruments

10.45 h – 11.15 h | Review of GaAs and GaP etch processes incl End Point Detection and Plasma Clean Processes | Dr Ligang Deng - Oxford Instruments

11.15 h – 11.30 h | Coffee break

11:30 - 11:45 | Efficient Plasma Cleaning for PECVD | Dr Owain Thomas, Oxford Instruments

11.45 h - 12.30 h | Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges | Adriana Creatore - TU Eindhoven

12.30 h – 13.45 h Lunch break

13.45 h - 14.00 h | Cryo- and Bosch-DRIE Processes for Demanding Top-down Approaches in MEMS Fabrication Stefan Scholz | RWTH Aachen

14.00 h – 14.30 h | Materials processing in biomedical applications: PECVD, etching and ALD | Dr Ravi Sundaram - Oxford Instruments

14.30 h – 15.00 h | RIE for Silicon Photonics
Dr Wahlbrink
| AMO Aachen

15.00 h – 15.30 h | Spectroscopic Ellipsometry – consideration for in-situ applications | Thomas Wagner - LOT/ Woollam

15.30 h – 15.45 h | Coffee break

15.45 - 16:15 | in situ diagnosis and end point detection | Dr Mike Cooke - Oxford Instruments

16.15 - 16:45 | Metal stack etching for magnetic tunnel junctions | Dr Andrew Newton - Oxford Instruments

16.45 h
Final Discussion

The cost will be Euro 240 to cover the catering and conference dinner. Oxford Instruments can offer assistance with your travel organisation, please let us know if you need require this.

Register for this event below.

Workshop on Dry Processing

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Registration form

Workshop on dry processing for Nanoelectronics and Micromechanics: Deposition and Etching

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