‘Nanoscale Plasma Processing 2012’ workshop announced at MTL, Cambridge, MA, USA on 5th December 2012
17 October 2012
Oxford Instruments Plasma Technology & MIT’s Microsystems Technology Laboratories (MTL), Cambridge, MA announce a seminar which will address the latest research and technologies in plasma etch deposition and growth. This 1 day event on 5th December, at the MIT campus in Cambridge, MA, will be comprised of presentations, discussions, and a networking lunch, focussing on latest innovations.
“We’ve been hosting these successful seminars worldwide for several years, most recently in The Molecular Foundry, LBNL, Caltech, USA and Shanghai, China, and we typically attract a large number of participants to each event”, says Stuart Mitchell, VP Sales for Oxford Instruments America Inc, “These workshops provide an ideal opportunity for academic and industrial technologists to network and share ideas, and we are delighted to be holding this joint workshop with Microsystems Technology Laboratories.”
The Seminar will include speakers from key international research institutes, who will discuss their research: Prof. Erwin Kessels, Technical University Eindhoven; Vince Genova, Cornell University. In addition, experts in their field from Oxford Instruments & MTL will speak about recent process and applications developments in a number of plasma processing areas.
Presentations cover a full day and currently include:
An Overview of Plasma ALD process
Nanoscale dielectric etching
PECVD & TEOS
Dr. Vicky Diadiuk, Associate Director, Operations, at MTL, ”This event at MTL will allow our students and researchers to learn more about Atomic Layer Deposition and plasma processing, from the experts at Oxford Instruments, while also attracting participants from the wider technical community. We look forward to welcoming guests to MIT for what promises to be a full and interesting day. ”
This seminar is free of charge, but must be booked in advance as places are limited. To book a place or receive further information, email: firstname.lastname@example.org.