Oxford Instruments Asylum Research and the Center for Nanoscale Systems at Harvard University Present a Workshop on AFM Nanomechanical and Nanoelectrical Characterization, Aug. 21-22  
04 August 2014

Oxford Instruments Asylum Research and Harvard University’s Center for Nanoscale Systems (CNS) announce an AFM Workshop and Tutorials Aug. 21-22. The workshop will focus on new techniques and instrumentation for nanomechanical and nanoelectrical characterization. Leading AFM scientists in their respective fields of materials and bioscience will present their latest results on the first day of the meeting. Invited speakers include: Kathy Aidala, Mount Holyoke; Tom Arruda, Salve Regina University; Bryan Huey, Univ. of Connecticut;  Cristian Staii, Tufts University; Matt Whitfield, MIT; and Dalia Yablon, SurfChar LLC. AFM techniques and scans modes will be demonstrated live on the Asylum Research Cypher ES™ Environmental AFM. The second day of the workshop will include tutorial demonstrations on nanomechanics and electrical characterization techniques, including scanning microwave impedance microscopy (sMIM). 
The workshop is ideal for both novice and experienced AFM users. The first day of the workshop is free to all attendees. There is $25 fee per tutorial for those wishing to participate in the small group tutorials on day two. Due to limited seating, attendees must register. The complete schedule and registration can be found at www.AsylumResearch.com/HW.