Top southern USA University expands nanofabrication research capabilities
10 November 2014
Vanderbilt University in Tennessee, USA is expanding its research capabilities with the addition of an Oxford Instruments PlasmaPro® 100 Cobra plasma etch system, shortly to be installed in the University’s Vanderbilt Institute of Nanoscale Science and Engineering (VINSE) clean-room laboratory.
The highly configurable PlasmaPro 100 Cobra system offers ICP dry etching supported by an extensive range of processes, making it eminently suitable for nanofabrication research.
Says Professor Anthony Hmelo, Associate Director for Operations at VINSE, “Until now we have needed to access other regional shared laboratories to undertake the type of processing that will now be facilitated at VINSE using the PlasmaPro 100. We’re consequently very excited about this purchase, and look forward to working together with Oxford Instruments to take advantage of this highly versatile tool.”
Dr David Haynes, Sales and Marketing Director at Oxford Instruments Plasma Technology comments, “Our broad range of plasma etch systems offers compact ICP and RIE tools through to multi wafer and cluster tools. As well as providing systems for production, our systems are used globally for fundamental research and development, utilising many new and advanced techniques. Having one of our PlasmaPro 100 Cobra systems installed at VINSE to further their research is great news for us.”