Launch of a Revolutionary SDD - X-Max Extreme
10 August 2015

Oxford Instruments, a world leader in microanalysis systems, has launched X-Max Extreme, a Silicon Drift Detector that promises to be a breakthrough solution for ultra high resolution FEG and FIB-SEM applications. This unique detector for the first time enables EDS data collection at very low kV (e.g. between 1kV and 3kV) and a very short working distance to provide elemental analysis under the conditions used to analyse nano-materials and surfaces at the highest SEM resolution.

The latest ultra-high resolution FEG-SEMs offer exciting new capabilities for investigating smaller nano-structures, interfaces and surfaces. However, under the operating conditions used to make use of new electron signal contrasts from in-lens detectors - very short working distance, very low kV and minimal beam current - no traditional SDD could provide supporting elemental characterisation. The new X-Max Extreme changes this. X-Max Extreme is based on a windowless 100mm2 detector; it uses a radical geometry to enable data acquisition under short working distance. With X-Max Extreme, both imaging and EDS performance can be performed simultaneously and the EDS resolution approaches that of the SEM.

According to X-ray Business Manager, Dr. Simon Burgess, “X-Max delivers solutions beyond conventional micro- and nano- analysis.  For example, the sensitivity of the Extreme allows users to characterise the composition and distribution of surface contaminants and layers a few atoms thick. It also provides superb detection of light elements, including lithium.”

X-Max Extreme was launched at M&M 2015 in Portland, Oregon in August, where it was demonstrated on the show floor.

Congratulations to Dr Kate A. Ross for winning the 2018 Lee Osheroff Richardson (LOR) Science Prize for North and S… https://t.co/5GEVpMSy6K
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