Research institutes globally invest in Oxford Instruments plasma systems for Graphene and 2D materials development
20 May 2015
As developments in graphene and 2D materials technology continue to increase, research institutes globally are investing in Oxford Instruments’ leading plasma processing Nanofab® equipment using CVD, PECVD and ICPCVD techniques to further their work in this important area. Multiple orders have recently been received from prestigious research centres in Europe and the USA, including the United States Naval Research Laboratory (NRL) and University College, London. Chemical Vapour Deposition (CVD) has been one of the most successful techniques for the fabrication of nanostructured materials such as graphene, carbon nanotubes and other 1D and 2D nanomaterials. The Nanofab is ideal for this field of research as it combines several essential features for high performance growth such as a high temperature heater capable of processing up to 200 mm wafers, shower head technology, automatic load lock for wafer handling as well as flexible options for liquid/solid precursor delivery.
Prof Zheng-Xiao Guo, of University College London said, “We recently placed an order for a Nanofab, chosen for its operating capability, process control, and great flexibility for further modification and upgrades. We also like the fact that we will be provided with dedicated after-sales support, not only in running the system, but also in enhancing the scope of our applications.”
Dr David Haynes, Sales and Marketing Director at Oxford instruments Plasma Technology commented, “In recent years there has been a great increase in graphene R&D worldwide, due to the impact that this area of research is expected to exert on tomorrow’s technologies and world economy. Several national research projects as well as industrial companies are now active in graphene production and applications, and more are set to follow, and we are extremely pleased that UCL, UK and NRL, USA amongst others have chosen our Nanofab systems.”