Products In This Group

Atomic Scale Processing

Atomic Scale Processing

Our range of plasma processing systems provide a complete solution to Atomic Scale Processing

ICP CVD

ICP CVD

Plasma deposition of high quality dielectric films at low temperature with low damage.

Ion Beam Deposition (IBD)

Ion Beam Deposition (IBD)

Ion beam technology that allows films to be etched or deposited by the use of beams of charged ions in a high vacuum system.

Ion Beam Etch (IBE)

Ion Beam Etch (IBE)

Ion beam technology that allows films to be etched or deposited by the use of beams of charged ions in a high vacuum system.

Nanoscale Growth

Nanoscale Growth

CVD, PECVD and ICP CVD for growth of nanomaterials

Congratulations to Jacob Bunn and Elizabeth Seal of Oxford Instruments NanoScience to receive the 'Apprenticeship o… https://t.co/gzmYxsSH1J
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