Driving innovation at the atomic scale

Our range of plasma processing systems provide a complete solution to Atomic Scale Processing. We provide unique cluster capability or stand alone systems enabling the manipulation of matter with atomic scale precision.

Atomic scale processing solutions in one system

Sputter/evaporate metal contact Atomic Layer EtchAtomic Layer Etch Atomic Layer Deposition CVD or ALD of 2D TMDCs

Atomic precision on a production scale

Conformal ALD coating

Conformal ALD coating

Etched Si trenches

Etched Si trenches

a-Si Etching

a-Si Etching

CVD Growth of hBN

CVD Growth of hBN

CVD ZnO nanowire growth

CVD ZnO nanowire growth

Specialised hardware with the ability to control plasma to deposit, grow and etch exciting new materials that enable the next generation of device technology

Example: FET flow diagram
 

FET flow diagram

Related Process Techniques

Nanoscale Growth

Nanoscale Growth

CVD, PECVD and ICP CVD for growth of nanomaterials

Related Tools

FlexAL-montage

FlexAL ALD Tool

Remote plasma & thermal ALD in one flexible tool

PlasmaPro 100 Cobra ICP Etch

PlasmaPro 100 Cobra ICP Etch

PlasmaPro 100 offers advanced plasma etch and deposition solutions on one platform with loadlock or cassette to cassette for RIE, ICP etch, ICP CVD and PECVD, upto 200mm single wafer platforms or multi-wafer batch capability.

Nanofab

Nanofab

Controllable growth of nanotubes and nanowires with flexible temperature up to 1200°C