Indium Tin Oxide (ITO) Deposition

ITO has applications in solar cells, touch panel contact, electrodes for LCD and electro chromic, EMC shielding and anti-static coatings. It may be deposited using Physical Vapour Deposition  (PVD), also known as Sputter Deposition. Some process benefits include; good control of film composition, smooth surface and low resistivity.

Process Specification

  PlasmaPro 100 PlasmaPro 400
Rotating Static
Deposition rate: > 40nm min > 3nm min > 40nm min
Refractive Index: 1.9 - 2.1
Uniformity: < ± 15% (250mm Target Size) ± 5% (200mm Target Size) < ± 15% (250mm Target Size)
Single wafer size: Up to 200mm Up to 150mm Up to 200mm
Batch size: - 4 x 150mm or 8 x 100mm
No. Targets: 1 4

These results are for indicative purposes only.
For a detailed process specification please contact your sales representative.