Strontium Titanate (SrTiO3) Atomic Layer Deposition (ALD)

SrTiO3 may be deposited using Atomic Layer Deposition  (ALD).

Process Specification

Precursors: StarTi, HyperSr
Non-metal precursors: O2 (plasma)
Temperature range: 300ºC
Growth rate per cycle: 0.45 Å/cycle @  300ºC

These results are for indicative purposes only.
For a detailed process specification please contact your sales representative.

 

Related Process Techniques

Related Tools

OpAL_Montage

OpAL ALD Tool

Open loaded thermal ALD tool with plasma option

FlexAL-montage

FlexAL ALD Tool

Remote plasma & thermal ALD in one flexible tool