Titanium Dioxide (TiO2) Deposition

TiO2 may be deposited using the following process types:

Titanium Dioxide (TiO2) Ion Beam Deposition

Titanium Dioxide (TiO2) Ion Beam Deposition

  Ionfab 300
Deposition rate: 0.5 - 3.5 nm/min
Uniformity: < 0.5 % - ± 3 %
Wafer size: Up to 200mm
Stress (compressive):2 < 500MPa

Notes:

  1. With 5mm edge exclusion, uniformity described below
  2. Stress and uniformity value are guaranteed for deposition rates up to 50% of maximum rate

These results are for indicative purposes only.
For a detailed process specification please contact your sales representative.

 

Titanium Oxide (TiO2) Atomic Layer Deposition (ALD)

Titanium Oxide (TiO2) Atomic Layer Deposition (ALD)

TiO2 may be deposited using Atomic Layer Deposition (ALD).

Process Specification

Precursors: TTIP - titanium isopropoxide - Ti(OC3H7)4 - liquid bubbled @ 40°C
Non-metal precursors: H2O thermal, O2 plasma
Temperature range: 30ºC - 300ºC
Growth rate per cycle: 0.46Å/cycle @ 200°C
Deposition rate 0.35nm/min @ 200°C
Refractive Index: 1.44 @ 300°C
Uniformity: ± 1.5% over 100, ± 2.5% over 150mm, ± 3.5% over 200mm (FlexAL)

These results are for indicative purposes only.
For a detailed process specification please contact your sales representative.

 

Titanium Oxide (TiO2) Sputter Deposition

Titanium Oxide (TiO2) Sputter Deposition

TiO2 may be deposited using Physical Vapour Deposition  (PVD), also known as Sputter Deposition.

Process Specification

  PlasmaPro 400
Deposition rate: > 10nm min
Uniformity: ± 5% (200mm Target Size)
Single wafer size: Up to 150mm
Batch size: 4 x 150mm or 8 x 100mm

These results are for indicative purposes only.
For a detailed process specification please contact your sales representative.

 

 

Related Process Techniques

Ion Beam Deposition (IBD)

Ion Beam Deposition (IBD)

Ion beam technology that allows films to be etched or deposited by the use of beams of charged ions in a high vacuum system.

Related Tools

Ionfab 300

Ionfab 300

Offers the flexibility to perform etch and/or deposition and maximising system utilisation

FlexAL-montage

FlexAL ALD Tool

Remote plasma & thermal ALD in one flexible tool