Titanium Dioxide (TiO2) Ion Beam Deposition

  Ionfab 300
Deposition rate: 0.5 - 3.5 nm/min
Uniformity: < 0.5 % - ± 3 %
Wafer size: Up to 200mm
Stress (compressive):2 < 500MPa


  1. With 5mm edge exclusion, uniformity described below
  2. Stress and uniformity value are guaranteed for deposition rates up to 50% of maximum rate

These results are for indicative purposes only.
For a detailed process specification please contact your sales representative.


Dr Ziad Melhem of Oxford Instruments NanoScience will be giving a talk at MIT on the enabling technologies, require… https://t.co/MDz2SojzYv
5:21 PM - 16 Feb 18
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