Aluminium doped Zinc Oxide (ZnO) Sputter Deposition

ZnO has may be deposited using Physical Vapour Deposition (PVD), also known as Sputter Deposition.

Process Specification

  PlasmaPro 400
Deposition rate: > 30nm min
Refractive Index: 1.8 - 2.0
Uniformity: < ± 15% (250mm Target Size)
Single wafer size: Up to 200mm

These results are for indicative purposes only.
For a detailed process specification please contact your sales representative.