Patterned Sapphire Substrate (PSS) etch

Single wafer etch solutions for PSS and GaN in the HBLED market

  • Presenting an evolution in single wafer etch technology. With extensive experience of etching materials, our technologies enable the cost of ownership and yield required to maximise the performance of your devices.
  PlasmaPro 100 Polaris
Wafer size: 100mm & 150mm
Etch rate: > 150nm/min
Uniformity: < ±3% (3mm edge exclusion)
Selectivity to PR: > 0.9:1

These results are for indicative purposes only.
For a detailed process specification please contact your sales representative.

View our PSS webinar