1µm PbSe etchLead Selenide (PbSe) Etching

PbSe and related films may be dry etched smoothly in a chlorine free process using ICP etch process chambers.

Process specification:

  PlasmaPro 100 Cobra180
Etch rate: > 50nm/min
Uniformity: < ± 5 %
Selectivity to PR: > 5:1
Wafer size: Up to 100mm

These results are for indicative purposes only.
For a detailed process specification please contact your sales representative.


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