Platforms available from Plasma Technology


	PlasmaPro 80

PlasmaPro 80

Compact open load system for RIE, ICP etch, ICP CVD and PECVD.


	PlasmaPro 100

PlasmaPro 100

Process modules built on 200mm platforms, with single wafer and multi-wafer batch capability.


	FlexAL

FlexAL

Remote plasma & thermal ALD in one flexible tool


	PlasmaPro 800

PlasmaPro 800

Large capacity open-loading process solutions for plasma etch and deposition


	PlasmaPro 1000

PlasmaPro 1000

Maximised batch etch and deposition for LED production


	Ionfab 300

Ionfab 300

Offers the flexibility to perform ion beam etch and/or deposition and maximising system utilisation


	Nanofab

Nanofab

Controllable growth of nanotubes and nanowires with flexible temperature up to 1200°C


	OpAL

OpAL

Open loaded thermal ALD tool with plasma option