PlasmaPro 100 Polaris single wafer etch toolAn evolution in single wafer etch technology - PlasmaPro 100 Polaris

With extensive experience of etching materials such as GaN, SiC and Sapphire, our technologies enable the cost of ownership and yield required to maximise the performance of your devices.

The PlasmaPro 100 Polaris single wafer etch system offers smart solutions to produce the superb etch results you need to maintain your competitive edge.

Product features
  • Designed specifically for harsh chemistries
  • Fast etch rates uniformly on wafers up to 200mm diameter
  • Developed with reliability, uptime and ease of serviceability in mind
  • Low cost of ownership
  • Clusterable with other PlasmaPro systems
  • Actively cooled electrode to maintain sample temperature during etch process
  • Exclusive Electrostatic Clamp technology capable of clamping sapphire,
    GaN on sapphire and silicon
  • High power ICP source producing high density plasmas
  • Magnetic spacer for enhanced ion control and uniformity
  • High conductance pumping system
  • Reliable hardware and ease of serviceability for excellent uptime

Download the brochure...

PlasmaPro 100 Polaris Brochure

Leading the way with single wafer etch solutions

PDF 1.30MB

Videos

LED Applications & Systems

LED Applications & Systems

Webinar: PSS Etching

Webinar: PSS Etching

Tool Support

Service & Support Contracts

Service & Support Contracts

Tailored service contracts: choose options that suit you