Large Batch PECVD system - PlasmaPro 1000 Stratum

The PlasmaPro 1000 Stratum PECVD tool provides outstanding benefits for LED manufacturers

Our large batch PECVD tool has been specifically developed for passivation deposition in LED production

  • Designed for the deposition of SiO2 and SiNx layers
  • High quality device performance and yield
  • Reliable hardware and ease of serviceability for excellent uptime

Batch sizes:

Its large area electrode and optimised showerhead design allows up to the following number of wafers in a single load:

Wafer Size Number of Wafers
150mm/6" 7
100mm/4" 15
50mm/2" 61
Product features

The PlasmaPro 1000 Stratum provides outstanding benefits for LED manufacturers

  • 490mm electrode giving unparalleled throughput from industry leading batch sizes of up to 7 x 6” wafers
  • High quality device performance and yield
  • Reliable hardware and ease of serviceability for excellent uptime
  • Low cost of ownership
  • Optimised for batch production, the PlasmaPro 1000 Stratum has a vacuum load lock as standard, with open load and cluster capability options
  • System designed to minimise cleaning overhead

 

Download the brochure

Related Process Techniques

Atomic Layer Deposition (ALD)

Atomic Layer Deposition (ALD)

Atomic layer deposition (ALD) Oxford Instruments' ALD systems include the FlexAL and the OpAL.

ICP CVD

ICP CVD

Inductively Coupled Plasma Chemical Vapour Deposition

Ion Beam Deposition (IBD)

Ion Beam Deposition (IBD)

Ion Beam Deposition (IBD)

PECVD

PECVD

Plasma Enhanced Chemical Vapour Deposition

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PlasmaPro 100 PECVD System

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