PlasmaPro 80 offers versatile plasma etch and deposition solutions on one platform with convenient open loading. This compact, smallfootprint system is easy to site and easy to use, with no compromise on process quality.
The PlasmaPro 80 is ideally suited to R&D or small-scale production, and can process from the smallest wafer pieces to 200mm wafers
The open load design allows fast wafer loading and unloading, ideal for research, prototyping and low-volume production
RIE, ICP, PECVD & ICPCVD modules available