PlasmaPro 80 offers versatile plasma etch and deposition solutions on one platform with convenient open loading. This compact, smallfootprint system is easy to site and easy to use, with no compromise on process quality.

  • The PlasmaPro 80 is ideally suited to R&D or small-scale production, and can process from the smallest wafer pieces to 200mm wafers
  • The open load design allows fast wafer loading and unloading, ideal for research, prototyping and low-volume production
  • RIE, ICP, PECVD & ICPCVD modules available

Products In This Group

PlasmaPro 80 compact RIE tool

PlasmaPro 80 compact RIE tool

PlasmaPro 80 compact open loading RIE tool

PlasmaPro 80 Cobra compact ICP etch tool

PlasmaPro 80 Cobra compact ICP etch tool

Compact open-loading tool for plasma etch

PlasmaPro 80 PECVD

PlasmaPro 80 PECVD

Compact open-loading tool for Plasma Enhanced Chemical Vapour Deposition (PECVD)

PlasmaPro 80 ICPCVD system

PlasmaPro 80 ICPCVD system

PlasmaPro 80 Stratum ICPCVD system