A compact open-loading tool for PECVD

Designed to produce high quality uniform dielectric films

PlasmaPro 80 offers versatile PECVD options with convenient open loading

This compact, smallfootprint system is easy to site and easy to use, with no compromise on process quality. Stress control is provided by selectable or mixed high/low frequency plasma power, enabling deposited films to be tuned for tensile, compressive or low stress.

Product features
  • Open-load design
  • Small footprint
  • Suited to R&D or small-scale production
  • Up to 200mm wafers
  • Fast wafer loading and unloading
  • Optimised electrode cooling results in excellent process control, wafer temperature uniformity and great flexibility, covering a wide range of processes
  • Enhanced process uniformity and rates are guaranteed by using a high-conductance radial (axially symmetric) pumping configuration
  • The addition of < 500ms datalogging offers traceability and history of chamber and process conditions
  • A close-coupled turbo pump provides high pumping speed and excellent base pressure
  • Clear ease of access to key components for improved serviceability and maintenance
  • The X20 control system greatly increases data retrieval and delivers faster, more repeatable matching
  • Fault and tool diagnostics via front end software enabling rapid fault diagnosis
  • Automatic purge enables purging of each toxic gas line in turn with a line flush in between - allowing safer, fully interlocked purging controlled by the front end software
  • Semi S2/S8 Compliant
  • A modular upgrade path for gas lines enables users to maximise flexibility. The remote gas line by-pass facility allows broad functionality & ease of use

Download the brochure...

PlasmaPro 80 Brochure

Compact open-loading tool for plasma etch and deposition

PDF 2.04MB

Gallery

Related Process Techniques

ICP CVD

ICP CVD

Plasma deposition of high quality dielectric films at low temperature with low damage.

Tool Support

Comdel Generator

Comdel Generator

Comdel Generator upgrade for increased performance

Dry Pump N2 Standby Mode

Dry Pump N2 Standby Mode

Get the dry pump N2 standby mode upgrade to save energy & nitrogen

Gas Pod

Gas Pod

Our upgraded gas pods have the capability of being able to incorporate extra gas lines, allowing the user great flexibility.

LogViewer Software

LogViewer Software

New datalogging software that allows realtime graphing and post run analysis

Optical End Point Detectors

Optical End Point Detectors

Optical end point detection Upgrades for etch & deposition tools

Ionfab300-1-co

Soft Pump

Soft pump/Soft Vent feature upgrade for increased performance

Turbomolecular Vacuum Pump

Turbomolecular Vacuum Pump

Turbomolecular Vacuum Pump Upgrade

X20 Control System

X20 Control System

X20 control system designed to replace the Blue RS232 PLC.

Dr Ziad Melhem of Oxford Instruments NanoScience will be giving a talk at MIT on the enabling technologies, require… https://t.co/MDz2SojzYv
5:21 PM - 16 Feb 18
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