Versatile plasma etch and deposition solutions

  • The PlasmaPro 800 offers a large area plasma etch and deposition solution with convenient open loading in a compact, small footprint system, making it easy to site and easy to use, with no compromise on process quality
  • With 380mm or 460mm diameter table, the PlasmaPro 800 offers full 300mm or large batch 43 x 50mm (2”) capacity, enabling full production solutions and establishing it as a well proven market leading product

 

Products In This Group

PlasmaPro 800 large capacity open load RIE

PlasmaPro 800 large capacity open load RIE

Large capacity open-loading process solutions for reactive ion etch

PlasmaPro 800 open load PECVD system

PlasmaPro 800 open load PECVD system

Large capacity open-loading process solutions for PECVD