We would like to notify customers that Advanced Energy, the manufacturer of our generators have announced the obsolescence of several units, and we are able to offer superior replacements:

Obsolete unit New option
RFG 1251 Paramount 1.5KW Base Generator
RFG 3001 Paramount 3KW Generator

The Advanced Energy Paramount generator is the latest build specification for Oxford Instruments high frequency (HF) RIE, ICP and Sputter processes. Offering increased reliability and greater plasma stability though the use of digital control and phase synchronisation.

Upgrade benefits:

  • Optimises film uniformity and throughput with unprecedented power delivery accuracy
  • Enables faster, seamless process transitions
  • Provides advanced pulsing and pulse synchronisation
  • Reduces RF delivery system complexity
  • Reduces arc-caused contamination and damage

Related Tools

PlasmaPro 100 RIE System

PlasmaPro 100 RIE System

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PlasmaPro 100 Cobra ICP Etch

PlasmaPro 100 Cobra ICP Etch

PlasmaPro 100 offers advanced plasma etch and deposition solutions on one platform with loadlock or cassette to cassette for RIE, ICP etch, ICP CVD and PECVD, upto 200mm single wafer platforms or multi-wafer batch capability.

PlasmaPro 100 ICPCVD System

PlasmaPro 100 ICPCVD System

Designed to produce high quality films with high density plasmas at low deposition pressures and temperatures.

PlasmaPro 100 PECVD System

PlasmaPro 100 PECVD System

Designed to produce excellent uniformity and high rate films, with control of film properties

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